Ultra Thin Film Materials

List of Equipment

Our facilities for fabrication and surface sensitive analysis of ultrathin films include:

  • Langmuir-Blodgett trough (KSV Instruments);
  • Laminar flow hood systems (Connecticut CleanRooms):
  • Quartz crystal microbalance (Maxtek);
  • Plasma ion generator (March Instruments);
  • Programmable slide stainer (Zeiss);
  • Null ellipsometer (Microphotonics);
  • Surface plasmon spectrometer (being constructed);
  • FT-IR (Bruker Vector 22 and Bomem MB Series) (ATR and grazing incidence techniques as attachments);
  • Optical microscope with rotating polarizer/analyzer (Zeiss);
  • UV-vis spectrophotometer with polarizers (Perkin Elmer);
  • Contact angle goniometer (Micro-CAM);
  • Spin-coater (SPS);
  • Ocean Optics, S-2000; and
  • PDA UV-vis probe spectroscopy system.

We have facilities equipped for substrate preparation, synthesis and characterization of amphiphiles, polyelectrolytes and surface active agents (organic and polymer synthesis facilities)

We have access to the following equipment/techniques via collaborations: Available at Materials Engineering and Physics Departments:

  • JEOL JEM 2000 TEM with Kevex EDX;
  • JEOL JAMP 30 Scanning Auger Microprobe;
  • Siemens D500 Diffractometer;
  • Denton D24 Magnetron Sputter Deposition System.

We have access through the Tri-Campus Materials Program (UAB and UAH) to:

  • Atomic Force Microscope (AFM);
  • Scanning Tuneling Microscope (STM) and other surface probe microscopy (SPM) variants; and
  • X-ray Photoelectron Spectroscopy (XPS).